Microstructured multilayer dielectric coatings with binary optical functions

摘要

Micropatterned interference filters have been developed by dry etching of dielectric multilayer stacks. Apart from the optical demands on the conventional filter design there are new requirements originating from the patterning process, which has to be stopped at the interface between two layers. In this paper the fundamental problems associated with the design and the development of micropatterned multilayer dielectric stacks are discussed. Details of the production of a two-stage filterarray are described and experimental results are presented