Bright Beam Method for Super-Resolution in E-Beam Lithography.

摘要

A method and apparatus for bonding a layer of coating material onto a substrate with minimal bulk heating of the substrate is tested. A pulsed electron beam generator is used to produce high energy electrons at the beginning of the pulse and a larger number of lower energy electrons at the end of the pulse. A thin sacrificial or ablative layer of an easily vaporized material such as tin is placed on top the coating. The high energy electrons penetrate through the ablative and coating layers. The ablative layer is heated to a molten state, causing it to vaporize. The ablation process generates a force on the coating layer which drives it into the substrate.