Manufacturing Optimization Problems of Electromagnetic Devices

摘要

During the duration of this project, we have developed several new algorithms forsimulation of microstructures, devices, and fabrication methods for IC technology. We have interacted extensively with both industrial and government labs and collaborated with personnel of both. We have developed algorithms for imaging of microstructures, investigated the effects of off-axis illumination and finite-thickness effects on mask imaging. Furthermore, we have investigated the effects of post-exposure baking on chemically amplified resists, optimized stepper parameters, as well as proximity effects on mask making. Last, but not least, we developed new visualization algorithms that allow multiple viewing of the microchip processes.