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Proceedings of the Ninth International Conference on Molecular Beam Epitaxy Heldin Malibu, California on August 5-9, 1996. Part 2 Sections IX-XVIII

机译:第九届分子束外延国际会议论文集,1996年8月5日至9日,加利福尼亚州Heldin malibu。第2部分第IX-XVIII部分

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In MBE-IX, 265 papers, including 14 invited talks, were selected from 400abstract submissions. The percentage of papers being selected is the lowest as compared to previous International MBE conferences, indicating strong interest and growth in MBE development. MBE is now of fundamental importance in the creation of advanced new materials and device structures for electronics, optoelectronics, and photonics applications. MBE has progressed to the point that it is now an important tool for both research and production applications. The scope of the conference covered the entire spectrum of MBE technology, from material aspects to device applications. Topics include MBE technology and growth for III-V, II-VI compounds, group-IV elements and alloys; nitrides and antimonides, quantum dots, wires, and wells; in situ monitoring, control, processing, and characterization; gas-source MBE including MOMBE and CBE; and

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