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Development and Application of In-Situ, Real Time and Ex-Situ CharacterizationTechniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces

机译:原位,实时和原位表征技术的研究与应用,以研究高温超导(HTsC)薄膜和界面的生长

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摘要

The objectives of this program are: (1) To demonstrate Time of Flight IonScattering and Recoil (ToF-ISARS) Spectroscopy and Spectroscopic Ellipsometry (SE) for in-situ and real time characterization of HTSC thin films and processes. (2) To study HTSC thin film processes and interface reactions.

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