Advanced Pulsed Laser Deposition System with In-Situ Ellipsometric Diagnostics

摘要

The proposal described and requested funding for part of what is intended tobecome a larger system representing an optics-based research facility for ultrafast pulsed laser deposition and characterization of modulated films, coatings, and surface structures. An in-situ diagnostics approach is used as a process control, through real-time feedback, in manufacturing multilayer thin films and coatings. Experimental facilities employing optical techniques, in conjunction with other more conventional particle monitoring and control methods, provides new and advanced capability, as well as greater insight, into complex thin-film fabrication. Such insight has been, and continues to be, demanded by sophisticated industrial and government end users. The present program is aimed at establishing a multi-port pulsed laser vacuum deposition chamber with an in-situ multi-wavelength ellipsometer to be used as an optical diagnostic and feedback control device. This system will be attached to a versatile high average power ultrafast pulsed laser for the experimental development and fabrication of modulated thin-film materials and multilayers. It is intended to be a collaborative and interdisciplinary research facility set up at the Center for Ultrafast Optical Science at the University of Michigan.