Instrumentation to Enhance Optical Scatterometry for Semiconductor Metrology Development

摘要

This Equipment Grant enabled upgrades in our scatterometer research instrumentation and computational capability. This provided a unique capability to develop the metrology technique through performing collaborative investigations with SEMATECH, Texas Instruments, and IBM. These efforts demonstrated the potential of scatterometry to provide the semiconductor industry with a metrology tool for characterizing sub-0.1 m (and larger) features.