Alignment System for Anorad X-Ray Exposure Tool

摘要

An X-ray exposure tool has been completed, based on a commercially availablestage system. All of the individual functions, including mask and wafer loading, coarse and fine alignment, and exposure, have been demonstrated. The development of a user friendly software package to control the sequence of operations is continuing. In addition, an interferometer has been developed which performs absolute distance measurements with nanometer resolution. By switching between several optical fibers a single such interferometer may be used to make accurate measurements along a multiplicity of axes.