Semiconducting Diamond for Electronic Applications

摘要

This research work aims at fabricating high-quality polycrystalline diamond thin films and at doping these films with Li/Na in order to obtain n- type semiconducting behavior. A hot filament chemical vapor deposition reactor is employed to deposit polycrystalline diamond films. We have successfully interfaced a spectroscopic ellipsometer to our chemical vapor deposition (CVD) system for the in situ monitoring of the diamond film deposition process. We have also interfaced our CVD to the emission. A study of the parameter space is underway in order to determine the optimum deposition window.