Dynamic Scaling in Cellular Automata Simulations of Deposition Processes

摘要

Cellular automata simulations can be used to capture many of the essential features of processes that are difficult to model. They are particularly useful in the study of nonlinear dynamical systems that have complex continuous solutions. In this study, cellular automata models have been employed to investigate the nature of the vapor deposition process by exploring the natural evolution of dynamical dissipative systems using self-organized critical system analysis and spatial scaling measures. A new numerical technique is introduced to analyze the intrinsic structure of evolving surface topography in an effort to better understand the dynamics of the growth processes. This technique is being used to validate the integrity of deposition models through a comparative analysis with experimental data and to determine if a correlation exists between intrinsic surface structure and parameters controlling the deposition process.