Electro-Optical Devices: RF/Optical and IR Systems.

摘要

Instrumentation is requested for probing the surface morphology and composition of electronic/optical materials with Air Force applications. This instrumentation is needed for development of advanced materials processing methods for new RF/optical and infrared devices. The Air Force needs for such devices are in (1) optically controlled phased array radar or in optical transmission of RF signals and (2) mid-IR countermeasure systems. The requested items fall into two categories: instrumentation for imaging of etched or ion- sliced ferroelectric surfaces and instrumentation for in situ diagnostics of infrared materials being etched or surface passivated in a UHV environment. The instrumentation will be used in a large multidisciplinary laboratory with a proven record of research and collaboration with DoD laboratories and industries.