Model Polyhedral Oligomeric Silsesquioxane Thin Films for Coating Applications

摘要

The possibility of forming Polyhedral Oligomeric Silsesquioxanes (POSS) based coatings is considered. Surfactant POSS molecules (containing hydrophilic silanol 'head' groups and hydrophobic organic coronas) are spread on water in a Langmuir Blodgett apparatus and the surface pressure-area relationships are determined and correlated to the structure of the POSS surfactant. Langmuir-Blodgett transfer of surfactant POSS onto silicon substrates is considered as a model 'dip coat' application; however, POSS monolayers do not appear to be sufficiently stable to undergo Langmuir Blodgett transfer. The thin film stability is discussed.