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Critical Current Density and Microstructure Variations in YBa2Cu3O7-x + BaSnO3 Films with Different Concentrations of BaSnO3 (Postprint).

机译：不同浓度BasnO3（后印刷）YBa2Cu3O7-x + BasnO3薄膜的临界电流密度和微观结构变化。

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Previous work on YBa2Cu3O7-x (YBCO) + BaSnO3 (BSO) films with a single composition showed significant critical current density (Jc) improvements at higher fields but lowered Jc in low fields. A detailed study on BSO concentrations provided here demonstrat ...

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作者
C. V. Varanasi H. Wang J. Burke J. H. Lee L. Brunke;
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年度 2008
页码 1-9
总页数 9
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Additives; Critical current; Critical temperature; Current density; Electric conductors; Films; Flux pinning; High temperature superconductors; Magnetic fields; Microstructure; Nanocolumns; Pulsed laser deposition; Transition temperature; Transport current; Yttrium barium copper oxides;

机译：添加剂;临界电流;临界温度;电流密度;电导体;薄膜;磁通钉扎;高温超导体;磁场;微结构;纳米柱;脉冲激光沉积;转变温度;传输电流;钇钡铜氧化物;

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1. Fabrication and critical current density analysis of YBa2Cu3O7+(BaSnO3)'/YBa2Cu3O7+(BaSnO3)'' multilayer films [J] . Horide Tomoya, Sakamoto Nobuhiro, Ichinose Ataru, Superconductor Science & Technology . 2016,第8期

机译：YBA2Cu3O7 +（BasnO3）'/ YBA2Cu3O7 +（BasnO3）''多层膜的制造和临界电流密度分析
2. Effect of BaCeO3 and BaSnO3 additives on microstructural development and critical current density of melt textured YBa2Cu3O7-x [J] . Jongprateep O., Dogan F., Strasik M., IEEE Transactions on Applied Superconductivity . 2005,第3期

机译：BaCeO3和BaSnO3添加剂对熔融织构YBa2Cu3O7-x的微观结构发展和临界电流密度的影响
3. Critical Current Density And Microstructure Variations In Yba_2cu_3o_(7-x) + Basno_3 Films With Different Concentrations Of Basno_3 [J] . C.V. Varanasi, J. Burke, L. Brunke, Journal of Materials Research . 2008,第12期

机译：不同浓度Basno_3的Yba_2cu_3o_（7-x）+ Basno_3膜中的临界电流密度和微观结构变化
4. HIGH CRITICAL CURRENT DENSITIES IN Nb_3Sn FILMS WITH ENGINEERED MICROSTRUCTURES- ARTIFICIAL PINNING MICROSTRUCTURES [C] . D.R. Dietderich, M. Kelman, J.R. Litty, International cryogenic materials conference;ICMC;Cryogenic engineering conference;CEC . 1998

机译：带有工程化微结构的Nb_3Sn膜的高临界电流密度-人工钉扎微结构
5. Study of critical current density in superconducting magnesium diboride films grown by ex situ annealing of CVD boron films. [D] . Hanna, Mina. 2009

机译：通过CVD硼薄膜的异位退火生长的超导二硼化镁薄膜中的临界电流密度的研究。
6. Microstructure characterization of BaSnO3 thin films on LaAlO3 and PrScO3 substrates from transmission electron microscopy [O] . Hwanhui Yun, Koustav Ganguly, William Postiglione, -1

机译：LaAlO3和PrScO3衬底上BaSnO3薄膜的显微结构表征
7. Effect of Partial Melting Parameters on the Microstructures and Critical Current Density of Bi-2212 Thick Films [O] . Zhang Shengnan, Li Chengshan, Hao Qingbin, 2012

机译：部分熔融参数对Bi-2212厚膜微结构和临界电流密度的影响

Critical Current Density and Microstructure Variations in YBa2Cu3O7-x + BaSnO3 Films with Different Concentrations of BaSnO3 (Postprint).

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