Next Generation Focusing Lenses for Proton Beam Writing

摘要

The principal investigator (PI) has designed a new system for proton beam writing (PBW). The key characteristics are an improvement of the system demagnification of up to 8 and 30 in x and y respectively compared to commercially available systems from Oxford Microbeams. The target chamber is under construction and the system is expected to be assembled in October 2009. The PI has shown initial test on PBW for Ni and Au nanowire fabrication as well as ZnO nanowire fabrication. We have improved the resist development for nano wire template fabrication through optimization of resist which yielded higher resist contrast using the GG developer. A new resist material, TADEP has been investigated in combination with PBW and has shown details down to 110 nm. The PI has conducted 13 talks on Proton Beam Writing in which research was presented that was supported through this grant from AOARD.