High Accuracy Thickness Measurement of Electron Transparent Evaporated Silver Films

摘要

High accuracy thickness measurements of evaporated silver films can be obtained by electron absorption measurements in an electron microscope. The method is particularly applicable to the detection of removal of surface layers of electron transparent thin film specimens. The removal of one monolayer can be detected. The calibration process for evaporated silver films is described in detail. The same technique is suitable for any type of thin film manufacturing process that produces thin films of equal thickness over an area of at least (3mm) squared. The capability of the method is demonstrated by measuring the sputtering yield constant of silver bombarded by argon ions inside the electron microscope. (Author)