Some New Freeze Photoelastic Materials and Their Application

摘要

Detailed studies principally on three dimensional photoelasticity by the freezing method were made of some new materials. These include epoxy resin cured by poly addition reaction, homopolymer or unsaturated alkyd and diallyl phthalate cured by chain copolymerization reaction, and copolymer resins (copolymers: styrol, divinyl benzol, diallyl phthalate and diallyl cyanurate). The properties of these resins vary widely according to type and orientation of starting material, method of synthesis, catalyst, hardener, accelerator or curing conditions. Favorable and unfavorable qualities with respect to freezing were evaluated. Consistency of quality reproducibility and applicability as anisotropic photoelastic material were investigated. (Author)