PREPARATION OF VAPOR-DEPOSITED MATERIALS FOR USE IN FIELD-ENHANCED ELECTRON EMISSION STUDIES

摘要

The general principles of chemical vapor deposition (CTD) are desorbed and specific experimental results on the deposition of pyrolytlc graphite, of CTD baron nitride, and sod of CTD tungsten en tungsten substrates ere discussed. In order to obtain uniform, enlsotroplo, thin films of pyrelytie graphite end CTD boron ni¬tride, the deposition parameter such as deposition temperature, concentration of the gaseous reactants, and gas flow pattern were varied, and the or influence on the deposits was studied.