An Investigation of New Materials Suitable for the Fabrication of Space Charge Amplifiers

摘要

Reasons for studying Boron Phosphide in the context of space charge conduction are discussed. The method adopted for the production of Boron Phosphide is described. Results involving runs with two reactant flasks are described. Various thin films were produced and also several allotropic forms of phosphorus, but no Borom Phosphide. Results involving runs with one reactant flask, using the addition compound PCl3.BBr3 are described. After several runs at gradually increasing temperatures, Boron Phosphide deposits were produced at a reaction temperature of 700 degrees C. Runs were performed to show that Boron Phosphide was produced not by thermal decomposition, but by the reduction of the addition compound, the reaction being Cl3P.BBr3 + 3H2 arrow BP + 3HCl + 3HBr. Present work on trying to reduce impurity contents and to produce epitaxy is discussed and the intended alternative methods of Boron Phosphide production described. (Author)