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Admittance of an Aperture Antenna Radiating into a Warm Overdense Plasma Layer

机译:入射到温暖的高密度等离子体层中的孔径天线的导纳

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The input impedance of an aperture radiating into a warm, overdense plasma layer is derived and studied. In the limit when the warm plasma layer is thin the author has found that the thin sheath approximation first obtained by Fante still holds, provided that in addition to the usual conditions, some additional simple constraints are satisfied. (Author)

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