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Fluorine Pressure Change Monitor for a Reacting System.

机译:用于反应系统的氟气压力变化监测仪。

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Recent experimental results on the performance of a pulsed HF chemical laser have indicated that the presence of HF in the chemical reactants prior to laser initiation degrade the laser performance. In order to monitor the amount of HF produced when the chemical reactants are mixed, a device has been developed that measures the change in concentration of one of the reactants. This device,which relies on the absorption of light by molecular F2,has been shown to have an accuracy of better than 5percent in the measurement of the F2pressure. (Author)

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