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Photoplastic Recording Materials.

机译:光塑性记录材料。

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The objective of this program was the characterization and development of photoplastic materials for optical memory storage applications. The mechanism of hologram formation in photoplastic materials was studied. Although the technique of corona charging was evaluated, a new technique of parallel-plane charging was developed and found to be preferable to corona charging. A study of the PVK-TNF photoconductor system revealed the mechanism of photoconduction and indicated that the origin of the latent image is immobilized electrons. Techniques were developed to reduce the latent image to reasonable levels. Four thermoplastics were investigated,including an examination of their bandpass nature,the formation of 'frost,'and the heating process. An evaluation was made of the number of record-erase cycles each material can withstand and causes of degradation were identified. Two materials were capable of over 8000record-erase cycles. The holographic response of photoplastic materials was characterized through measurements of exposure sensitivity,diffraction efficiency,signal-to-noise ratio,and frequency response. In addition,the holographic response was found to be extremely sensitive to the heat input used to develop the photoplastic hologram. (Author)

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