Superconducting Thin Films in the Niobium-Vanadium and Titanium-Tantalum Systems.

摘要

Thin films of Nb-V and Ti-Ta allloys have been deposited by DC co-sputtering onto fused quartz at substrate temperatures of 700C. Deposition rates averaged 100A per minute and the thickness of all samples was of the order of 3000A. Jc-H characteristics were measured by a pulsed field-pulsed current technique and Tc's by monitoring the electrical resistance with temperature. Tc's in the Ti-Ta system are generally lower than in bulk,but considerably higher in the Nb-V system. The Jc's in both systems are comparatively high at low fields,but fall off rapidly with increasing magnetic fields. (Author)