Applications of Ion Beams to Modify the Properties of Materials.

摘要

Ion implantation can modify the properties of materials by changing their electrical, optical, chemical or mechanical properties, and this technique is already in commercial use for production of semiconductor devices. The 65 papers presented at the conference on 'Applications of Ion Beams to Materials' (U. of Warwick, 8-12 Sept 1975) covered the applications of ion beams to semiconductors, insulators, and metals and included studies of radiation damage. All these aspects of the conference proceedings are summarized in this report, which also contains background material for the non-specialist. (Author)