Fundamental Studies of the Structure and Growth of Electrodeposited Nickel.

摘要

Nickel was electrodeposited from a Watts bath onto annealed, shock-loaded and cold-rolled polycrystalline copper substrates, at 50 degrees C and using a range of current densities. The microstructures of the substrates and the nickel electrodeposits were examined by optical and electron microscopy techniques. It was observed that the nickel overgrowth structure showed similar trends on all three substrates, indicating that substrate dislocations did not influence the structure of the deposits. The grain size, the orientation and the deposit thickness were found to be the predominant factors influencing overgrowth structure.