Optical Recording Characteristics of KF:LiF Photodichroic Crystals.

摘要

An analysis was made of the optical recording and readout characteristics of the photodichroic KF:LiF crystal containing F sub A defects as the activated medium. The results of a series of measurements indicate, in agreement with the analysis, that this crystal system has the highest photosensitivity of any direct reversible recording material without a gain mechanism (approx. 1 mJ/sq. cm.). The modulation transfer function for a 200-micrometers-thick activated layer was measured to be 40% at 75 lines/mm. The dynamic range exceeded 40 dB. The crystal can be operated fatigue free at 220 K by use of thermoelectric coolers, although optimum performance is predicted for a temperature of about 100 K. The wavelength range of photosensitivity lies in the blue and green and matches the argon laser lines. (Author)