Color Contrast Sensitivity Measuring Device.

摘要

The present invention is directed to an apparatus for generating patterned images whose color distribution, in terms of composition and spatial frequency, can be altered without substantially varying the uniformity of the photometric luminance across the image. Two separate means provide beams of broad spectrum luminous energy. One of the two beams is altered to have a pattern of spatially varying luminous intensity by interposing a variable contrast pattern. Then, individual linear polarizers establish polarizations in each beam, which polarizations are preferably orthogonal. A beam splitter divides each such polarized beam into substantially equivalent portions, which, upon being interleaved, appear on two distinct optical axes. A unique color filter in each of these optical axes changes the color composition from the broad spectrum originally introduced to the color extremes sought for analysis. A means is then provided for commingling these two beams back into a single beam.