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Effects of Ionizing Radiation on SOI/CMOS Devices Fabricated in Zone-Melting-Recrystallized Si Films on SiO2

机译：电离辐射对siO2区熔融 - 再结晶硅薄膜制备sOI / CmOs器件的影响

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Tsaur, B. Y.; Mountain, R. W.; Chen, C. K.; Turner, G. W.; Fan, J. C. C.;
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年度 1984
页码 p.1-4
总页数 4
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Silicon; Complementary metal oxide semiconductors; Semiconducting films; Ionizing radiation; Field effect transistors; Insulation; Substrates; Silicon dioxide; Reprints;

机译：硅;互补金属氧化物半导体;半导体薄膜;电离辐射;场效应晶体管;绝缘;基板;二氧化硅;重印;

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1. CMOS Compatible Nonvolatile Memory Devices Based on SiO2/Cu/SiO2 Multilayer Films [J] . WANG Yan, LIU Qi, LV Hang-Bing, 中国物理快报：英文版 . 2011,第007期
2. Total ionizing dose radiation effects on NMOS parasitic transistors in advanced bulk CMOS technology devices [J] . He Baoping, Wang Zujun, Sheng Jiangkun, Journal of Semiconductors . 2016,第12期

机译：总电离剂量辐射对先进的体CMOS技术器件中NMOS寄生晶体管的影响
3. SPICE MODELING OF IONIZING RADIATION EFFECTS IN CMOS DEVICES [J] . Tatjana Pesic-Brdjanin Facta Universitatis. Series Electronics and Energetics . 2017,第2期

机译：CMOS器件中电离辐射效应的空间模型
4. Radiation effects in advanced SOI devices: New insights into Total Ionizing Dose and Single-Event Effects [C] . Gaillardin M., Raine M., Paillet P., IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference . 2013

机译：先进SOI设备中的辐射效应：总电离剂量和单事件效应的新见解
5. Hierarchical simulation method for total ionizing dose radiation effects on CMOS mixed-signal circuits. [D] . Mikkola, Esko. 2008

机译：用于CMOS混合信号电路的总电离剂量辐射效应的分层仿真方法。
6. Hollow waveguides with low intrinsic photoluminescence fabricated with Ta2O5 and SiO2 films [O] . Y. Zhao, M. Jenkins, P. Measor, -1

机译：用Ta2O5和SiO2薄膜制造的具有低本征光致发光的空心波导
7. Overview of ionizing radiation effects in image sensors fabricated in a deep-submicrometer CMOS imaging technology [O] . Goiffon Vincent, Estribeau Magali, Magnan Pierre 2009

机译：在深亚微米CMOS成像技术中制造的图像传感器中的电离辐射效应概述
8. Effects of Ionizing Radiation on n-Channel MOSFET's Fabricated in Zone-Melting-Recrystallized Si Films on SiO2 [R] . Tsaur, B. Y., Fan, J. C. C., Turner, G. W., 1982

机译：电离辐射对siO2区熔融 - 再结晶硅薄膜制备n沟道mOsFET的影响

Effects of Ionizing Radiation on SOI/CMOS Devices Fabricated in Zone-Melting-Recrystallized Si Films on SiO2

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