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Theoretical Investigations of Elementary Processes in the Chemical Vapor Deposition of Silicon from Silane. Unimolecular Decomposition of SiH4

机译：硅烷化学气相沉积硅原子过程的理论研究。单分子分解siH4

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Viswanathan, R.; Thompson, D. L.; Raff, L. M.;
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年度 1984
页码 p.1-13
总页数 13
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Silicon; Vapor deposition; Silanes; Decomposition; Dynamics; Theory; Reprints;

机译：硅;气相沉积;硅烷;分解;动力学;理论;重印;

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1. Lattice kinetic Monte Carlo simulation of epitaxial growth of silicon thin films in H-2/SiH4 chemical vapor deposition systems [J] . Pablo Balbuena Juan, Martin-Bragado Ignacio Thin Solid Films . 2017,第jula31期

机译：H-2 / SiH4化学气相沉积系统中硅薄膜外延生长的晶格动力学蒙特卡洛模拟
2. Radio frequency bias power effects on silicon nitride film deposited in SiH4-NH3 using a plasma-enhanced chemical vapor deposition [J] . Suyean Kim, Byungwhan Kim Metals and Materials International . 2009,第5期

机译：射频偏压对等离子体增强化学气相沉积法沉积在SiH4 -NH3 中的氮化硅膜的影响
3. Nanocrystalline cubic silicon carbide films prepared by hot-wire chemical vapor deposition using SiH4/CH4/H-2 at a low substrate temperature [J] . Komura Y, Tabata A, Narita T, Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2006,第9a20期

机译：通过在低衬底温度下使用SiH4 / CH4 / H-2热线化学气相沉积制备的纳米晶立方碳化硅膜
4. Reactive Force-Field Molecular Dynamics Study of the Silicon-Germanium Deposition Processes by Plasma Enhanced Chemical Vapor Deposition [C] . Naoya Uene, Takuya Mabuchi, Masaru Zaitsu, International Conference on Simulation of Semiconductor Processes and Devices . 2020

机译：等离子增强化学气相沉积硅锗沉积过程的反应力场分子动力学研究
5. The study of alternating flow chemical vapor infiltration and a novel kinetics determination technique for the vapor deposition of silicon carbide via the decomposition of methyltrichlorosilane. [D] . Chiang, Daniel Young. 1999

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6. Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene [O] . Martin Müller, Milan Bouša, Zdeňka Hájková, 2020

机译：CVD石墨烯上等离子增强化学气相沉积法制备的无转移反型石墨烯/硅异质结构
7. Plasma assisted chemical vapor deposition silicon oxynitride films grown from SiH4 + NH3 + O2 gas mixtures [O] . Olivares Roza J., Sánchez Olga, Albella J. M. 1998

机译：由SiH4 + NH3 + O2气体混合物形成的等离子体辅助化学气相沉积氮氧化硅膜
8. Theoretical Studies of Elementary Processes in the Chemical Vapor Deposition of Silicon from Silane [R] . Raff, L. M., Thompson, D. L. 1986

机译：硅烷化学气相沉积硅原子过程的理论研究

Theoretical Investigations of Elementary Processes in the Chemical Vapor Deposition of Silicon from Silane. Unimolecular Decomposition of SiH4

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