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Chemical Bonding and Reactions at Ti/Si and Ti/Oxygen/Si Interfaces

机译：Ti / si和Ti /氧/ si界面的化学键合和反应

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Butz, R.; Rubloff, G. W.; Ho, P. S.;
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年度 1984
页码 p.1-8
总页数 8
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Chemical bonds; Titanium; Silicon; Oxygen; Semiconductors; Refractory metals; Interfaces; Chemical reactions; Atomic structure; Layers; Electronic states; Silicides; Microstructure; Microscopy; Spectroscopy; Surfaces; Reactivities; Reprints;

机译：化学键;钛;硅;氧;半导体;难熔金属;界面;化学反应;原子结构;层;电子态;硅化物;微结构;显微镜;光谱学;表面;反应性;重印;

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Chemical Bonding and Reactions at Ti/Si and Ti/Oxygen/Si Interfaces

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