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Comparison of Laser-Initiated and Thermal Chemical Vapor Deposition of Tungsten Films

机译：钨膜激光引发和热化学气相沉积的比较

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Deutsch, T. F.; Rathman, D. D.;
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年度 1984
页码 p.1-4
总页数 4
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Vapor deposition; Tungsten; Laser applications; Chemical lasers; Excimers; Argon; Fluorine; Laser beams; Silicon; Silicon dioxide; Electrical resistance; Microstructure; Temperature; Refractory metals; Reaction kinetics; Reprints;

机译：气相沉积;钨;激光应用;化学激光;激光;氩;氟;激光束;硅;二氧化硅;电阻;微观结构;温度;难熔金属;反应动力学;重印;

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2. The use of optical microscopy to examine crystallite nucleation and growth in thermally annealed plasma enhanced chemical vapor deposition and hot wire chemical vapor deposition a-Si:H films [J] . Mahan A. H. Journal of Applied Physics . 2012,第10期

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4. Uniform Deposition of Chemical Vapor Deposition Diamond Films on Slender Tungsten Wires [C] . Xinchang Wang, Xiaotian Shen, Tianqi Zhao, Chinese Materials Conference . 2016

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5. Chemical vapor deposition of tungsten-based diffusion barrier thin films for copper metallization. [D] . Kim, Dojun. 2009

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6. Synthesis and Characterization of Tungsten Nitrido Amido Guanidinato Complexes as Precursors for Chemical Vapor Deposition of WNxCy Thin Films [O] . Michelle M. Nolan, Alexander J. Touchton, Nathaniel E. Richey, -1

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8. Comparison of Laser-Initiated and Thermal Chemical Vapor Deposition of Tungsten Films. [R] . Deutsch, T. F., Rathman, D. D. 1984

机译：钨膜激光引发和热化学气相沉积的比较。

Comparison of Laser-Initiated and Thermal Chemical Vapor Deposition of Tungsten Films

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