Laser Induced Damage at 1.06 Micrometers of Titanium Oxide Thin Films Deposited by the Sol-Gel Process

摘要

Pulsed laser-induced damage, at 1.06 micrometers, of titanium oxide interference coatings was studied. Coatings were applied to silicon wafers by a solvent evaporation (sol-gel) process. Trends in the laser-induced damage threshold as a function of process parameters and coatings properties were observed. Baking temperature and coating thickness were identified as key factors to be controlled in producing high laser damage threshold coatings. Microscopy and helium-neon scattering were compared as damage detection methods. The sensitivity of the two-methods were found to be equivalent. However, helium-neon scattering was found to be superior. The speed and automated data reduction capabilities of the computer-controlled scatterometer made it suitable for large optics and high-volume applications.