Particle Beam Alignment System for Single Event Upset - Van de Graaff Experiments

摘要

This report documents the design and operation of the particle beam alignment system developed for single event upset - Van de Graaff experiments. This system is designed to provide a faster and more accurate optical alignment of the pinhole and the device under test. In this alignment system a laser beam is focused on the device under test, and the pinhole is then aligned with the laser beam using an electronic display. In this way the pinhole is aligned over the device under test. The alignment system consists of three main components: 1. A beam expander for the He-Ne laser which was previously used for pinhole alignment, and neutral density filters to attenuate the laser beam when necessary 2. A new flange for the sample chamber incorporating a calibrated x-y translation stage for the pinhole, and a calibrated x-y translation stage carrying a quadrant photodiode 3. An amplifier and display module to display the output of the photodiode.