Ion Plating: Fundamental Processing Studies and Synthesis of High Performance Coatings

摘要

Ion plating is a physical vapor deposition process which uses a plasma to modify the microstructure/microchemistry of thin film coatings. This research has directly shown that processing variables such as plasma energy/density; substrate temperature; deposition rate; and substrate surface chemistry directly effect the deposited film microstructure and chemistry. This processing technique allows mechanically strong/chemically graded interface layers to be produced between dissimilar material. Film adhesion with this process is correspondingly excellent. This process was used to produce corrosion and wear resistant hard coatings.