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Surface Reconstruction and the Nucleation of Palladium Silicide on Si(111)

机译:si(111)表面重构及钯硅化物的形核

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Scanning tunneling microscopy has been used for real-space imaging of the initial interaction of palladium with the Si(111)-(7 x 7) surface at room temperature. The nucleation of silicide is spatially localized and occurs only in the faulted half of te (7 x 7) unit cell. Large-scan-area images have been statistically analyzed to determine the subsurface extension of the silicide nuclei and the nature of growth as a function of coverage and island size. Steps are found to have no influence on the nucleation at this temperature. Nucleation, Growth, Steps, Palladium, Reprints, Silicon compounds. (MJM)

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