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Plasma-Deposited Organosilicon Thin Films as Dry Resists for Deep UltravioletLithography

机译：等离子沉积有机硅薄膜作为深紫外光刻的干抗蚀剂

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作者
Horn, M. W.; Pang, S. W.; Rothschild, M.;
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年度 1990
页码
总页数 4
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Thin films; Lithography; Vapor deposition; Lasers; Reprints;

机译：薄膜;光刻;气相沉积;激光;重印;

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专利

1. A Chemical Study of Plasma-Deposited Organosilicon Thin Films as Low-k Dielectrics [J] . Anna M. Coclite, Antonella Milella, Fabio Palumbo, Plasma processes and polymers . 2009,第8期

机译：等离子体沉积有机硅薄膜作为低k电介质的化学研究
2. Effects of condensation reactions on the structural, mechanical, and electrical properties of plasma-deposited organosilicon thin films from octamethylcyclotetrasiloxane [J] . April D. Ross, Karen K. Gleason Journal of Applied Physics . 2005,第11期

机译：缩合反应对八甲基环四硅氧烷等离子体沉积有机硅薄膜的结构，机械和电性能的影响
3. Facile immobilization of enzyme by entrapment using a plasma-deposited organosilicon thin film [J] . Elagli Adil, Belhacene Kalim, Vivien Celine, Journal of molecular catalysis, B. Enzymatic . 2014,第Null期

机译：通过使用等离子沉积有机硅薄膜的包埋来轻松固定酶
4. Plasma deposition characterization and photochemistry of organosilicon hydride network polymers: versatile resists for all-dry mid-deep UV photolithography [C] . Timothy W. Weidman, ATT Bell Labs., Murray Hill, Conference on advances in resist technology and processing . 1993

机译：有机硅氢化物网络聚合物的等离子体沉积表征和光化学：适用于全干燥中深紫外光刻的多功能抗蚀剂
5. Atomistic analysis of the surface reactivity, roughness, and crystallinity of plasma-deposited amorphous silicon thin films. [D] . Valipa, Mayur S. 2005

机译：等离子体沉积非晶硅薄膜的表面反应性，粗糙度和结晶度的原子分析。
6. Dry Lithography of Large-Area Thin-Film Organic Semiconductors Using Frozen CO2 Resists [O] . Matthias E Bahlke, Hiroshi A Mendoza, Daniel T Ashall, -1

机译：使用冻结的CO2抗蚀剂进行大面积薄膜有机半导体的干法光刻
7. TMMF dry film resist as masking layer in deep etching of Pyrex-glass for microfluidic chip fabrication [O] . Yusof Azmi, Zengerle Roland, Koltay Peter 2011

机译：TMMF干膜抗蚀剂在用于微流控芯片制造的耐热玻璃深腐蚀中作为掩膜层

Plasma-Deposited Organosilicon Thin Films as Dry Resists for Deep UltravioletLithography

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