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Influence of Pulsed Magnetic Fields on Uniaxial Stress of Films

机译:脉冲磁场对薄膜单轴应力的影响

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We have developed experimental pulsed field techniques by which stress isconsiderably reduced in films of Fe80B15Si5. One technique involves the application of a magnetic field of 500 Oe along the hard axis and maintaining the annealing temperature at 275 C. The other technique involves rotation of the film in the presence of the field. We model the reduction in stress in terms of a reduction of defects induced by gas inclusions during film preparation. Our estimate of the stress reduction is in reasonable agreement with other estimates deduced from extended X-ray absorption fine structure (EXAFS) studies. Our studies suggest a systematic experimental technique by which the magnetic anisotropy field can be tailored in a film.

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