Optical Characterization and Patterning of Nonlinear Optical Polymers withPhotocrosslinking Groups

摘要

Two photosensitive polymers have been characterized for their linear opticalproperties. The changes of absorbance and of the index of refraction due to UV radiation have been investigated. Holographic gratings were written in these photopolymers. The diffraction efficiencies of these holographic gratings were used to measure the index changes. It was demonstrated that an index pattern can be easily written in these two photopolymers by using a one step conventional photolithographic process. These photopolymers can exhibit large second order nonlinearities. It is expected that photolithographic patterning techniques investigated will play an important role in integrated optical device fabrication.