Utilization of Ion Chromatography and Statistics to Determine Important Acids in Chromium Plating and Electropolishing Solutions

摘要

Inadequate monitoring of sulfuric and chromic acids in chromium plating solutions and phosphoric and sulfluric acids in electropolishing solutions can cause serious problems for the chromium plating industry, such as poor quality products, wasted human resources, and wasted electrical energy. Current instrumental analysis methods, both offline and online, for these acids either do not result in acceptable precisions or are time consuming. Two similar methods, which are improvements on existing ion chromatographical methods, are presented here that provides acceptable analysis and monitoring of these acids in this chromium plating process.