Diamond Membranes for X-ray Lithography Masks. Phase 2.

摘要

In Phase 2 of this program we improved and refined the microwave plasma process for fabricating diamond membranes for X-ray lithography masks. Nucleation procedures were developed to eliminate uncertainty in membrane growth initial conditions. Deposition uniformity improvements were made which allowed us to produce 36 mm membrane diameters routinely. Process conditions affecting tensile stress, grain size and optical properties were explored and high quality membranes obtained reproducibly. Conditions having potential to produce significant improvements in membrane characteristics were identified for future investigation. Membranes produced in this program were characterized in terms of Raman spectrum, grain size, optical absorption, tensile stress, and X-ray absorption. X-ray damage studies were performed which indicated that an accumulated dose of 20 MJ/cu m, the limit of the test, would not injure the membranes.