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Photo-Oxidation of sigma-Conjugated Si-Si Network Polymers

机译:Σ-共轭si-si网络聚合物的光氧化

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The ultraviolet-induced photooxidation of polyalkylsilyne network polymers hasbeen examined. Infrared and x-ray photoelectron spectroscopies indicate a higher oxygen coordination about the Si atoms following photolysis than observed for the linear polysilanes. A photochemical pathway leading to cleavage of the alkyl groups from the Si backbone has been observed, the products of which then desorb as the respective alkanes or 1-alkenes via a thermally activated process. Finally, the photooxidation rate at 193 nm of then polyalkylsilyne films is photon limited at fluences less than 1-5 mJ/cm2 per pulse; whereas above this fluence, the photooxidation is oxygen limited. For the latter, the amount of oxygen chemically incorporated into the Si-Si network per laser pulse is dictated by the solubility level of oxidant in the film.

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