首页> 美国政府科技报告 >Modification of Polymer Surfaces and the Fabrication of Submicron-ScaleFunctionalized Structures by Deep-UV and Electron Beam Lithography
【24h】

Modification of Polymer Surfaces and the Fabrication of Submicron-ScaleFunctionalized Structures by Deep-UV and Electron Beam Lithography

机译:聚合物表面的改性及亚微米级功能化结构的深紫外和电子束光刻制备

获取原文

摘要

We present a general technique to modify polymer surfaces using N-hydroxysuccinimide (NHS) funtionalized perfluorophenyl azides (PFPAs). Thin polystyrene films are spin-coated with a solution containing the NHS PFPA ester and are either UV photolyzed with a dosage of 10 mJ sq cm or exposed with a 15 kV electron beam with a dosage between 1 and 75 micrometers / sq cm. The NHS active ester groups become covalently attached to the polymer via photogenerated or electron beam generated, highly reactive nitrene intermediates derived from the PFPA. Using this technique we demonstrate that well-defined surface regions can be funtionalized with a minimum observable feature size of 0.5 micrometers and 0.2 micrometers for UV and electron-beam exposure, respectively. Through reaction of the functionalized surfaces with primary amine-containing reagents, we have installed biological molecules on the polymer and have measured the activity of an immobilized enzyme. Polymers, Surface functionalization, Deep-UV lithography, Immobilization of biological molecules.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号