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Reliable Calibration Method for an Ion Current Controlled Electron BeamTransition Metal Deposition Source

机译:可靠的离子电流控制电子束过渡金属沉积源校准方法

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摘要

An alternative ion current controlled calibration scheme has been implemented forelectron beam transition metal (Co) deposition sources. A repeatable and practical means of positioning the source (tip), measuring the ion flux and determining the flux rate is given. Intrinsic variations in the structural parameters and thermal effects which can modify the growth rate are examined and compensated for. A stable regime where ion beam current is directly proportional

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