Evaluation of Pulsed UV-Laser Gas Phase Doping for Fabrication of HighPerformance Polysilicon TFTs

摘要

The primary purpose of this research effort is to investigate and characterizethe use of Gas Immersion Laser Doping (GILD) for the fabrication of polysilicon TFTs. To achieve this goal we will be investigating the fabrication of poly-Si mfs using both standard, industrially recognized doping and annealing processes along with and laser processing and annealing. jg p.2.