Porous SOS, BESOS and SOQ for Flat Panel Emissive Displays

摘要

This reports research to develop an efficient photonic source compatible withsilicon VLSI technology for flat panel emissive displays, optical interconnections, and optoelectronic applications. Recent research has shown that porous silicon layers can be formed on transparent sapphire (Al2O3) substrates and offers unique device geometries due to the ability to observe the photoemission through the substrate rather than relying on semitransparent (AU) or transparent (ITO) electrodes. It also details the fabrication of porous silicon layers on transparent sapphire, quartz and bonded SOS, and their corresponding emission spectrum.