Photomask Japan '94 Held in Kawasaki Science Park, Kanagawa, Japan on 22 April1994

摘要

The Photomask Japan 94 symposium, the first photomask meeting in the Far East,was held 22 Apr 94 in Kanagawa, Japan. In this one day meeting, 54 papers were presented covering such topics as mask fabrication, phase shift mask, x-ray and electron-beam masks, and metrology and equipment. In this report, selected papers on the development of sub 0.5 micrometer size masks are discussed. (AN).