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Fabrication of Two-Dimensional Rough Surfaces for Light Scattering andPolarization Measurements

机译:用于光散射和偏振测量的二维粗糙表面的制作

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摘要

The fabrication of characterized rough surfaces on photoresist is described. Thetechnique used here can be separated into two parts: first, a photoresist coating, generally 5 to 15 microns thick, is deposited on a flat glass substrate and baked in an oven; second, the plate is exposed, one line at a time, by a laser beam in a raster scanning method. Plate displacement is controlled by a PC computer in order to create the desired structure on the photoresist. Several deterministic and randomly rough gratings have been fabricated and characterized with a stylus profilometer.

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