Gap Control in the Fabrication of Quantum-Effect Device Using X-RayNanolithography

摘要

We report on recent advances in the fabrication of quantum effect devices using xray nanolithography. A novel scheme for gap control during the mask replication process was developed that uses capacitance sensing in a feedback loop. The capacitance between two masks is measured and held constant through control of the pressure between them. This scheme can be used to maintain the masks at a gap as small as 1 micron, thus reducing penumbra and diffraction. This capacitive feedback method used in mask to mask replication can, in principle, also be used for mask to substrate exposures and is thus an additional element in an x ray nanolithography technology for sub 70 nm features.