A novel chelating resin containing high levels of sulfamine group: Preparation and its adsorption characteristics towards p-toluenesulfonic acid and Hg(II)

摘要

A novel functional monomers with sulfamine (DM-BS) was prepared by quaternization of N,N-dimethyl-amino-2-ethyl methacrylate (DMAEMA) and 1-4 bromine methyl toluenesulfonamide (BS-Br). By grafting polymerization of DM-BS onto chloromethylated polystyrene matrix (CMPS), a new kind of adsorbent owned plenty of sulfamine functional group, PSC-DM-P(DM-BS) (PDP), was thereupon synthesized. The resulting DM-BS monomer and PDP adsorbent were characterized by nuclear magnetic resonance spectrum (~1HNMR and ~(13)CNMR), Fourier transform infrared spectrum (FT-1R), thermogravimetry (TG) and Elemental analysis. Meanwhile, the adsorption properties of PDP absorbent for Hg(II) and p-toluenesulfonic acid (p-TSA) in aqueous solution were investigated by batch method. The maximum adsorption capacities for Hg(II) and p-TSA were found to be 222.2 mg/g and 312.5 mg/g with the equilibrium time less than 90 min. Furthermore, the PDP absorbent also showed a high selectivity adsorption for Hg(II) among coexisting heavy metals and the good regeneration performance.