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首页> 外文期刊>Physica, C. Superconductivity and its applications >In situ growth of superconducting (Pb,Cu)(2)(Ba,Pb)(2)YCu2Oy epitaxial thin films by MOCVD
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In situ growth of superconducting (Pb,Cu)(2)(Ba,Pb)(2)YCu2Oy epitaxial thin films by MOCVD

机译:MOCVD原位生长超导(Pb,Cu)(2)(Ba,Pb)(2)YCu2Oy外延薄膜

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Superconducting (T-c= 38 K) thin films of (Pb,Cu)(2)(Ba,Pb)(2)YCu2Oy have been grown by MetalOrganic Chemical Vapor Deposition (MOCVD) on single crystal (001)LaAlO3 substrates in a single deposition run. The critical parameters for stabilizing lead-containing compounds in thin films are considered. It was found that a high vapor pressure of lead-containing species in the gas phase during the film growth determines the stability of formed compounds. The results of high-resolution transmission electron microscopy (HREM) and X-ray diffraction analysis (XRD) analyses of (Pb,Cu)(2)(Ba,Pb)(2)YCu2Oy thin films are presented. (C) 2000 Published by Elsevier Science B.V. [References: 28]
机译:(Pb,Cu)(2)(Ba,Pb)(2)YCu2Oy的超导(Tc = 38 K)薄膜已通过金属有机化学气相沉积(MOCVD)在单晶(001)LaAlO3衬底上以单次沉积法生长跑。考虑了稳定薄膜中含铅化合物的关键参数。发现在膜生长期间气相中的含铅物质的高蒸气压决定了所形成化合物的稳定性。给出了(Pb,Cu)(2)(Ba,Pb)(2)YCu2Oy薄膜的高分辨率透射电子显微镜(HREM)和X射线衍射分析(XRD)分析的结果。 (C)2000年由Elsevier Science B.V.出版[参考文献:28]

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