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Isoelectronic doping of AlGaN alloys

机译:AlGaN合金的等电子掺杂

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摘要

Isoelectronic doping of AlxGa1-xN alloys with arsenic in films grown by molecular beam epitaxy has been investigated. In photoluminescence spectra of these AlxGa1-xN layers, there is a gradual increase of the band gap and a smaller progressive shift of the position of blue emission band to the higher energies as the Al content increases. To explain the change in the energy of the blue band in As-doped AlxGa1-xN alloys a model has been proposed, which predicts the shift in the blue band energy to be equal to the valence band offset from AlGaN to GaN. This prediction is consistent with the experimental results. (C) 2003 WELEY-VCH Verlag GmbH & Co. KGaA, Weinheim. [References: 8]
机译:已经研究了通过分子束外延生长的薄膜中的砷对AlxGa1-xN合金的等电子掺杂。在这些AlxGa1-xN层的光致发光光谱中,随着Al含量的增加,带隙逐渐增加,蓝色发射带的位置向较高能量的方向逐渐减小。为了解释掺As的AlxGa1-xN合金中蓝带能量的变化,提出了一个模型,该模型预测蓝带能量的偏移等于从AlGaN到GaN的价带偏移。该预测与实验结果一致。 (C)2003 WELEY-VCH Verlag GmbH&Co.KGaA,Weinheim。 [参考:8]

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